A p–n junction is a boundary or interface between two types
of semiconductor material, p-type and n-type, inside a single crystal of
semiconductor. It is created by doping, for example by ion implantation,
diffusion of dopants, or by epitaxy (growing a layer of crystal doped with one
type of dopant on top of a layer of crystal doped with another type of dopant).
If two separate pieces of material were used, this would introduce a grain
boundary between the semiconductors that severely inhibits its utility by
scattering the electrons and holes.
When a P-type semiconductor is joined to a N-type
semiconductor such that the crystal structure remains continuous at the
boundary, a PN junction is formed. A PN junction forms a very useful device and
can be called a semiconductor diode, PN junction diode, or simply a crystal
diode. Simply joining two pieces together cannot form a PN junction, because it
would produce a discontinuous crystal structure. Special techniques are
required to assemble a PN junction. Normally P-type carriers are to the left of
the junction and N-type carriers to the right.
Since the junction diode is a two terminal device, the
application of voltage across its terminals leaves three possibilities:
- No bias
- Forward bias
- Reverse bias
No bias
This occurs when there is no external voltage
applied. The holes from the P-region diffuse into the N-region. They then
combine with the free electrons in the N-region. The free electrons from the
N-region diffuse into the P-region. These electrons combine with the holes.
Forward bias
When a battery is connected to the PN
junction diode such that the positive terminal is connected to the P-side and
negative terminal to the N-side, forward bias is created. When the PN junction
is forward biased, the holes are repelled from the positive terminal and are
forced to move towards the junction.
Similarly, the electrons are repelled from the negative terminal of the
battery and drift towards the junction. The current within the PN junction is
the sum of electron current and hole current.
Reverse bias
A voltage source is connected with the
positive terminal attached to the N-region and negative to the P-region. The
holes in the P-region are attracted towards the negative terminal of the
applied voltage, and the electrons in the N-region are attracted to the positive
terminal. Thus the majority carriers are drawn away from the junction. This
increases the barrier potential, which makes it more difficult for the carriers
to diffuse across the junction.
P-N Junction Diode characteristics
The PN junction region of a Junction Diode has the following
important characteristics:
1). Semiconductors contain two types of mobile charge
carriers, Holes and Electrons.
2). The holes are positively charged while the electrons
negatively charged.
3). A semiconductor may be doped with donor impurities such
as Antimony (N-type doping), so that it contains mobile charges which are
primarily electrons.
4). A semiconductor may be doped with acceptor impurities
such as Boron (P-type doping), so that it contains mobile charges which are
mainly holes.
5). The junction region itself has no charge carriers and is
known as the depletion region.
6). The junction (depletion) region has a physical thickness
that varies with the applied voltage.
7).When a diode is Zero Biased no external energy source is
applied and a natural Potential Barrier is developed across a depletion layer
which is approximately 0.5 to 0.7v for silicon diodes and approximately 0.3 of
a volt for germanium diodes.
8). When a junction diode is Forward Biased the thickness of
the depletion region reduces and the diode acts like a short circuit allowing
full current to flow.
9). When a junction diode is Reverse Biased the thickness of
the depletion region increases and the diode acts like an open circuit blocking
any current flow, (only a very small leakage current).
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